Memoirs of the Faculty of Engineering, Yamaguchi University

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Memoirs of the Faculty of Engineering, Yamaguchi University Volume 35 Issue 1
published_at 1984

Study on the Plasma Jet Device for Processing

プロセシング用プラズマジェット装置
Saeki Setsuo
Osaki Katashi
Fukumasa Osamu
Yamada Isao
fulltext
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KJ00000156544.pdf
Descriptions
General characteristics of the plasma jet device for processing were given for verious operating conditions (ambient pressure, feed gas flow rate etc.). Its device was consist of the forced constricted type plasma jet generator and the feed ring to inject processing materials into the plasma jet. Experiments were made at vessel pressure 200&acd