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Study on the Plasma Jet Device for Processing

Memoirs of the Faculty of Engineering, Yamaguchi University Volume 35 Issue 1 Page 183-189
published_at 1984
KJ00000156544.pdf
[fulltext] 589 KB
Title
プロセシング用プラズマジェット装置
Study on the Plasma Jet Device for Processing
Creators Saeki Setsuo
Creators Osaki Katashi
Creators Fukumasa Osamu
Creators Yamada Isao
Creators Sakiyama Satoshi
Source Identifiers
General characteristics of the plasma jet device for processing were given for verious operating conditions (ambient pressure, feed gas flow rate etc.). Its device was consist of the forced constricted type plasma jet generator and the feed ring to inject processing materials into the plasma jet. Experiments were made at vessel pressure 200&acd
Subjects
電気電子工学 ( Other)
Languages jpn
Resource Type departmental bulletin paper
Publishers 山口大学工学部
Date Issued 1984
File Version Version of Record
Access Rights open access
Relations
[ISSN]0372-7661
[NCID]AN00244228
Schools 工学部