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keywordelectron cyclotron resonance
publish year
1995 - 1999 1 2005 - 2009 1
keyword
electron cyclotron resonance 2 ECR 1 control of ECR plasma 1 etching plasma 1 ferrite 1 microwave electric field 1 reactive sputtering 1 sputtering 1 uniform plasma 1 wave propagation 1
resource type
journal article 2
school
大学院理工学研究科（工学） 2
Result 2 Items
Id (<span class="translation_missing" title="translation missing: en.view.desc">Desc</span>)
Development of low-temperature and high-rate-deposition technology for ferrite thin-films using ECR sputtering apparatus designed for mass production
粉体および粉末冶金 Volume 53 Issue 8
Creators : Yamamoto Setsuo | Matsuura Mitsuru | Okada Shigenobu | Shimosato Yoshihiro Publishers : 粉体粉末冶金協会 Date Issued : 2006-08
Measurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas
Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B
Creators : Furuse Muneo | Tamura Hitoshi | Watanabe Seiichi | Fukumasa Osamu Publishers : 応用物理学会 Date Issued : 1997-07
Related Creatrors
Yamamoto Setsuo 1 Fukumasa Osamu 1
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