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Study on the Plasma Jet Device for Processing

Memoirs of the Faculty of Engineering, Yamaguchi University Volume 35 Issue 1 Page 183-189

published_at 1984

KJ00000156544.pdf

[fulltext] 589 KB

Title

プロセシング用プラズマジェット装置

Study on the Plasma Jet Device for Processing

Creators Saeki Setsuo

Creators Osaki Katashi

Creators Fukumasa Osamu

Creators Yamada Isao

Creators Sakiyama Satoshi

Source Identifiers

General characteristics of the plasma jet device for processing were given for verious operating conditions (ambient pressure, feed gas flow rate etc.). Its device was consist of the forced constricted type plasma jet generator and the feed ring to inject processing materials into the plasma jet. Experiments were made at vessel pressure 200&acd

Subjects

電気電子工学 ( Other)

Languages jpn

Resource Type departmental bulletin paper

Publishers 山口大学工学部

Date Issued 1984

File Version Version of Record

Access Rights open access

Relations

[ISSN]0372-7661

[NCID]AN00244228

Schools 工学部