Si Resonant Tunneling MOS Transistor (SRTMOST) for Next Generation
Memoirs of the Faculty of Engineering, Yamaguchi University Volume 53 Issue 2
Page 123-131
published_at 2003-03
Title
次世代素子、Si 共鳴トンネルMOS トランジスタの提案及び理論検討
Si Resonant Tunneling MOS Transistor (SRTMOST) for Next Generation
Creators
Kihara Hiroyuki
Creators
Yamamoto Akinori
Creators
Matsuo Naoto
Source Identifiers
Creator Keywords
MOS
SRTMOST
dielectric film
resonant tunneling
logic circuit
The characteristics of the Si resonant tunneling metal-oxide-semiconductor transistor (SRTMOST), which was proposed to realize a low-power and high-speed characteristics, were reviewed. From the discussion related to the suppression of the DT from the source to the drain under the gate-off condition, the excellent switching operation, the optimum off-set energy between the dielectric films at the both channel edges and Si and the feasibility of the three-valued logic circuit, it is shown that the SRTMOST would become the potential candidate of the substitution for the conventional metal-oxide-semiconductor field-effect transistor (MOSFET) in the next generation.
Languages
jpn
Resource Type
departmental bulletin paper
Publishers
山口大学工学部
Date Issued
2003-03
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]1345-5583
[NCID]AA11422756
[isVersionOf]
[URI]http://memoirs.lib-e.yamaguchi-u.ac.jp/
Schools
工学部