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Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy

Thin solid films Volume 506-507 Page 536-540
published_at 2006
2008010119.pdf
[fulltext] 548 KB
Title
Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy
Creators Nakada Naoki
Creators Fukumasa Osamu
Creator Keywords
Volume negative ion sources VUV emission Vibrationally excited molecules
Effects of Ar addition are studied by using a beam injection type negative ion source. With adding Ar, I_<H-> increases at low base H_2 pressure. At high base H_2 pressure, however, I_<H-> decreases. VUV emission intensities also decrease at high base pressure. In other words, Ar addition is adverse effect for production of H_2 (v''). Therefore, decrease in I_<H-> is caused by decrease in H_2 (v''). In D_2 plasmas, variation patterns of plasma parameters and VUV intensities by Ar addition are nearly the same as ones in H_2 plasmas. Even in low base pressure, however, enhancement of I_<D-> is not observed.
Languages eng
Resource Type journal article
Publishers Elsevier
Date Issued 2006
File Version Author’s Original
Access Rights open access
Relations
[ISSN]0040-6090
[NCID]AA00863068
info:doi/10.1016/j.tsf.2005.08.138
[isVersionOf] [URI]http://www.sciencedirect.com/science/journal/00406090
Schools 大学院理工学研究科(工学)