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Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica acta Volume 56 Issue 3 Page 1172-1181
published_at 2011-01-01
Title
Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods
Creators Tanaka Yoriko
Creators Furuta Masahiro
Creators Kuriyama Koichi
Creators Kuwabara Ryosuke
Creators Katsuki Yukiko
Creators Kondo Takeshi
Creators Fujishima Akira
Creators Honda Kensuke
Creator Keywords
Nitrogen-doped hydrogenated amorphous carbon Plasma-enhanced chemical vapor deposition
Languages eng
Resource Type journal article
Publishers Pergamon Press Elsevier Science
Date Issued 2011-01-01
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0013-4686
[NCID]AA00633261
[NCID]AA11525861
info:doi/10.1016/j.electacta.2010.11.006
[isVersionOf] [URI]http://www.sciencedirect.com/science/journal/00134686
[isVersionOf] [URI]http://www.scopus.com/inward/record.url?eid=2-s2.0-78650513397&partnerID=40&md5=40f3b5fa7072e86476688453c5c226b1
Schools 大学院理工学研究科(理学)