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Development of low-temperature and high-rate-deposition technology for ferrite thin-films using ECR sputtering apparatus designed for mass production

粉体および粉末冶金 Volume 53 Issue 8 Page 679-685
published_at 2006-08
2009010324.pdf
[fulltext] 2.71 MB
Title
量産対応型ECRスパッタ装置によるフェライト薄膜の低温高速製造技術の開発
Development of low-temperature and high-rate-deposition technology for ferrite thin-films using ECR sputtering apparatus designed for mass production
Creators Yamamoto Setsuo
Creators Matsuura Mitsuru
Creators Okada Shigenobu
Creators Shimosato Yoshihiro
Creator Keywords
ECR electron cyclotron resonance sputtering reactive sputtering ferrite
Languages jpn
Resource Type journal article
Publishers 粉体粉末冶金協会
Date Issued 2006-08
File Version Version of Record
Access Rights open access
Relations
[ISSN]0532-8799
[NCID]AN00222724
info:doi/10.2497/jjspm.53.679
[isVersionOf] [URI]http://www.journalarchive.jst.go.jp/japanese/top_ja.php
Schools 大学院理工学研究科(工学)