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YIG ferrite thin-films epitaxially grown by reactive sputtering method

粉体および粉末冶金 Volume 51 Issue 3 Page 190-194
published_at 2004
2009010323.pdf
[fulltext] 1.05 MB
Title
反応性スパッタ法による作製においてエピタキシャル成長したYIGフェライト薄膜
YIG ferrite thin-films epitaxially grown by reactive sputtering method
Creators Yamamoto Setsuo
Creators Kuniki Hirofumi
Creators Kurisu Hiroki
Creators Matsuura Mitsuru
Creators Jang Pyungwoo
Creator Keywords
reactive sputtering YIG ferrite post-annealing GGG(111) substrate hetero-epitaxial growth
Languages jpn
Resource Type journal article
Publishers 粉体粉末冶金協会
Date Issued 2004
File Version Version of Record
Access Rights open access
Relations
[ISSN]0532-8799
[NCID]AN00222724
[isVersionOf] [URI]http://www.journalarchive.jst.go.jp/japanese/top_ja.php
Schools 大学院理工学研究科(工学)