Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance
真空 Volume 49 Issue 7
Page 424-429
published_at 2006
Title
反応性電子サイクロトロン共鳴（ECR）スパッタ法によるフェライト薄膜の低温高速作製
Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance
Creators
Tanaka Terumitsu
Creators
Oshiro Kazunori
Creators
Shimosato Yoshihiro
Creators
Okada Shigenobu
Creators
Matsuura Mitsuru
Languages
jpn
Resource Type
journal article
Publishers
日本真空協会
Date Issued
2006
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0559-8516
[NCID]AN00119871
[isVersionOf]
[URI]http://www.jstage.jst.go.jp/browse/jvsj/-char/ja/
Schools
大学院理工学研究科（工学）