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Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance

真空 Volume 49 Issue 7 Page 424-429
published_at 2006
Title
反応性電子サイクロトロン共鳴(ECR)スパッタ法によるフェライト薄膜の低温高速作製
Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance
Creators Tanaka Terumitsu
Creators Oshiro Kazunori
Creators Fujimori Hirotaka
Creators Kurisu Hiroki
Creators Shimosato Yoshihiro
Creators Okada Shigenobu
Creators Matsuura Mitsuru
Creators Yamamoto Setsuo
Languages jpn
Resource Type journal article
Publishers 日本真空協会
Date Issued 2006
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0559-8516
[NCID]AN00119871
[isVersionOf] [URI]http://www.jstage.jst.go.jp/browse/jvsj/-char/ja/
Schools 大学院理工学研究科(工学)