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Transparent Electrically Conducting Cd-Sn Oxide Films by D-C Reactive Sputtering

Memoirs of the Faculty of Engineering, Yamaguchi University Volume 29 Issue 1 Page 91-96
published_at 1978
KJ00000156229.pdf
[fulltext] 520 KB
Title
直流反応性スパッタ法による Cd-Sn 酸化物透明導電膜
Transparent Electrically Conducting Cd-Sn Oxide Films by D-C Reactive Sputtering
Creators Miyata Naoyuki
Creators Nao Satoru
Creators Miyake Kiyoshi
Source Identifiers
High conductive, transparent films of Cd-Sn oxide have been prepared by dc diode reactive sputtering of Cd-Sn alloys in Ar-O_2 mixtures. Alloy targets (Cd/Sn atomic ratio of 2 : 1) were utilized. Experiments have been carried out under the following conditions. The ratio of Ar/O_2 and the total pressure of gas mixture were ranged from 9/1 to 4/1,and from 1×(10)^<-2> to 6×(10)^<-2> Torr, respectively. The dc applied voltage was in the range of 1&acd
Subjects
電気電子工学 ( Other)
Languages jpn
Resource Type departmental bulletin paper
Publishers 山口大学工学部
Date Issued 1978
File Version Version of Record
Access Rights open access
Relations
[ISSN]0372-7661
[NCID]AN00244228
Schools 工学部