Plasma oxidation effects of co-containing ferrite thin film media deposited by reactive ECR sputtering
Journal of Magnetics Society of Japan Volume 26 Issue 4
Page 263-268
published_at 2002
Title
反応性ECRスパッタ法で作製したCo含有酸化鉄薄膜メディアのプラズマ酸化処理効果
Plasma oxidation effects of co-containing ferrite thin film media deposited by reactive ECR sputtering
Creators
平田 京
Creators
和田 宏文
Creators
松浦 満
Creators
土井 孝紀
Creators
田万里 耕作
Creator Keywords
Co-containing ferrite thin film media
reactive ECR sputtering
perpendicular magnetic recording
recording media
plasma oxidation
The post-oxidation effects of reactive-ECR-sputtered Co-containing ferrite thin films are described, focusing on their morphology and their magnetic and recording properties. A combination of reactive-ECR-sputter deposition and post-oxidation with ECR oxygen plasma was proved to be the best method for preparing Co-containing ferrite thin film media with good magnetic properties, smooth surface, low medium-noise characteristics, excellent roll-off curve, and small thermal fluctuation.
Languages
jpn
Resource Type
journal article
Publishers
日本応用磁気学会
Date Issued
2002
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
[isVersionOf]
[URI]http://www.wdc-jp.com/msj/journal/index.html
Schools
大学院理工学研究科（工学）