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Synthesis of diamond by thermal plasma processing under low pressure

日本金属学会誌 Volume 63 Issue 1 Page 55-61
published_at 1999
Title
減圧熱プラズマプロセスによるダイヤモンド合成
Synthesis of diamond by thermal plasma processing under low pressure
Creators Sakiyama Satoshi
Creators Fukumasa Osamu
Creator Keywords
diamond synthesis plasma jet thermal plasma chemical vapor deposition spectroscopic measurement plasma processing medium pressure
To realize the large area deposition of diamond films at a high rate, synthesis of diamond with the use of plasma jets under medium pressure, which are in the transition region from thermal plasmas to cold plasmas, is studied. Under low pressure, the morphology of deposited particles strongly depends on the ratio of methane gas flow rate to hydrogen gas flow rate, CH_4/H_2, and on the distance from the feed ring exit to the substrate, L. The euhedral diamond particles are synthesized when CH_4/H_2 is lower and L is shorter. To clarify the relationship between the morphology of the prepared particles and the chemical species in the plasma jet, emission spectra from the plasma jet have been studied. The spectra of the Balmer series of hydrogen, hydrocarbons and dicarbon have attracted special interest. Among these spectra, the spectral intensity ratio of CH to H_α at 1 mm above the substrate has a strong correlation with the quality of synthesized diamond and its deposition area.
Languages jpn
Resource Type journal article
Publishers 日本金属学会
Date Issued 1999
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0021-4876
[NCID]AN00062446
[isPartOf] [URI]http://www.jstage.jst.go.jp/browse/jinstmet/-char/ja/
Schools 大学院理工学研究科(工学)