Heat and mass transfer analysis for coating process of TiN thin film in a tubular reactor by thermal CVD
Kagaku kogaku ronbunshu Volume 40 Issue 5
Page 425-431
published_at 2014-09-20
Title
熱CVD法を用いた水平管型反応器内のTiN薄膜生成過程における熱物質移動解析
Heat and mass transfer analysis for coating process of TiN thin film in a tubular reactor by thermal CVD
Creator Keywords
化学蒸着法
窒化チタン
表面反応
拡散律速
数値解析
Chemical vapor deposition
Diffusion-controlling
Numerical simulation
Surface reaction
Titanium nitride
Languages
jpn
Resource Type
journal article
Publishers
化学工学会
Date Issued
2014-09-20
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0386-216X
[NCID]AN00037234
[isVersionOf]
[URI]https://www.jstage.jst.go.jp/browse/kakoronbunshu/40/5/_contents/-char/ja