Magnetic properties of Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma

ECRスパッタ法により作製したCo-Cr垂直磁気異方性膜の磁気特性

Magnetic properties of Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma

Creators 佐藤 王高

Creators Yamamoto Setsuo

Creators Kurisu Hiroki

Creators 松浦 満

Co-Cr single-layer perpendicular anisotropy films were prepared on polyimide films by sputtering using electron cyclotron resonance (ECR) microwave plasma. The dependence of the crystallographic and magnetic properties of the Co-Cr films on the Ar gas pressure, P_<Ar>, and the target-to-substrate distance, D_<T-S>, was investigated. An 0.09,μm thick Co-Cr film with excellent c-axis orientation?namely, Δθ_<50> of 3.35°?, a high perpendicular magnetic anisotropy field of 4.5 kOe, and a high perpendicular coercivity H_<c⊥> of 1530 Oe was achieved at a relatively high P_<Ar> of 8×10^<-2> Pa and a large D_<T-S> of 230 mm. It may be surmised that ion bombardment with moderate energy in the P_<Ar> and D^<T-S> conditions described above is suitable for the deposition of Co-Cr perpendicular anisotropy films.

[ISSN]0285-0192

[NCID]AN0031390X

https://doi.org/10.3379/jmsjmag.20.57

[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html