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Heat and mass transfer analysis during the formation process of SiO_2 thin solid film by thermal chemical vapor deposition and proposal of new chemical reaction model with particle generation

DT15100083_Abstract.pdf
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DT15100083_Fulltext.pdf
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Title
熱CVD法によるSiO_2薄膜生成過程における熱物質移動解析および粉体生成を伴った新規反応モデルの提案
Heat and mass transfer analysis during the formation process of SiO_2 thin solid film by thermal chemical vapor deposition and proposal of new chemical reaction model with particle generation
Degree 博士(工学) Dissertation Number 創科博甲第83号 (2022-03-16)
Degree Grantors Yamaguchi University
[kakenhi]15501 grid.268397.1
Creators 本田 美咲
Languages jpn
Resource Type doctoral thesis
File Version Version of Record
Access Rights open access