Heat and mass transfer analysis during the formation process of SiO_2 thin solid film by thermal chemical vapor deposition and proposal of new chemical reaction model with particle generation
Title
熱CVD法によるSiO_2薄膜生成過程における熱物質移動解析および粉体生成を伴った新規反応モデルの提案
Heat and mass transfer analysis during the formation process of SiO_2 thin solid film by thermal chemical vapor deposition and proposal of new chemical reaction model with particle generation
Degree
博士(工学)
Dissertation Number
創科博甲第83号
(2022-03-16)
Degree Grantors
Yamaguchi University
[kakenhi]15501
grid.268397.1
Creators
本田 美咲
Languages
jpn
Resource Type
doctoral thesis
File Version
Version of Record
Access Rights
open access