Honda Kensuke

Affiliate Master Yamaguchi University

Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica acta Volume 56 Issue 3 Page 1172-1181

published_at 2011-01-01

Title

Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Creators Tanaka Yoriko

Creators Furuta Masahiro

Creators Kuriyama Koichi

Creators Kuwabara Ryosuke

Creators Katsuki Yukiko

Creators Kondo Takeshi

Creators Fujishima Akira

Creators Honda Kensuke

Creator Keywords

Nitrogen-doped hydrogenated amorphous carbon Plasma-enhanced chemical vapor deposition

Languages eng

Resource Type journal article

Publishers Pergamon Press Elsevier Science

Date Issued 2011-01-01

File Version Not Applicable (or Unknown)

Access Rights metadata only access

Relations

[ISSN]0013-4686

[NCID]AA00633261

[NCID]AA11525861

info:doi/10.1016/j.electacta.2010.11.006

[isVersionOf] [URI]http://www.sciencedirect.com/science/journal/00134686

[isVersionOf] [URI]http://www.scopus.com/inward/record.url?eid=2-s2.0-78650513397&partnerID=40&md5=40f3b5fa7072e86476688453c5c226b1

Schools 大学院理工学研究科（理学）