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Fukumasa Osamu

Affiliate Master Yamaguchi University

Efficient negative ion production in rf plasmas using a mesh grid bias method

Review of Scientific Instruments Volume 79 Issue 2 Page 02A502-
published_at 2008-01
2007020174.pdf
[fulltext] 129 KB
Title
Efficient negative ion production in rf plasmas using a mesh grid bias method
Creators Okada Junichi
Creators Nakao Yuichi
Creators Tauchi Yasushi
Creators Fukumasa Osamu
Using a grid bias method for plasma parameter control, volume production of hydrogen negative ions H^- is studied in pure hydrogen rf plasmas. Relationship between the extracted H^? ion currents and plasma parameters is discussed. It is confirmed that both high and low electron temperature T_e plasmas are produced in the separated regions when the grid is negatively biased. In addition, with changing grid potential V_g, values of n_e increase while T_e decrease in their values. The negative ion production depends strongly on the grid potential and related plasma conditions.
Languages eng
Resource Type journal article
Publishers American Institute of Physics
Date Issued 2008-01
Rights
c2008 American Institute of Physics()
File Version Version of Record
Access Rights open access
Relations
[ISSN]0034-6748
[NCID]AA00817730
info:doi/10.1063/1.2805372
[isVersionOf] [URI]http://rsi.aip.org/rsi/
Schools 大学院理工学研究科(工学)