Fukumasa Osamu
Affiliate Master
Yamaguchi University
Efficient negative ion production in rf plasmas using a mesh grid bias method
Review of Scientific Instruments Volume 79 Issue 2
Page 02A502-
published_at 2008-01
Title
Efficient negative ion production in rf plasmas using a mesh grid bias method
Using a grid bias method for plasma parameter control, volume production of hydrogen negative ions H^- is studied in pure hydrogen rf plasmas. Relationship between the extracted H^? ion currents and plasma parameters is discussed. It is confirmed that both high and low electron temperature T_e plasmas are produced in the separated regions when the grid is negatively biased. In addition, with changing grid potential V_g, values of n_e increase while T_e decrease in their values. The negative ion production depends strongly on the grid potential and related plasma conditions.
Languages
eng
Resource Type
journal article
Publishers
American Institute of Physics
Date Issued
2008-01
Rights
c2008 American Institute of Physics()
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]0034-6748
[NCID]AA00817730
[isVersionOf]
[URI]http://rsi.aip.org/rsi/
Schools
大学院理工学研究科（工学）