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Fukumasa Osamu

Affiliate Master Yamaguchi University

Synthesis of diamond using low pressure plasma jet

Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 33 Issue 7B Page 4409-4412
published_at 1994
Title
Synthesis of diamond using low pressure plasma jet
Creators Sakiyama Satoshi
Creators Fukumasa Osamu
Creators Aoki Keiichirou
Creator Keywords
diamond synthesis chemical vapor deposition plasma jet thermal plasma plasma processing
With the use of the forced constricted type plasma jet, the synthesis of diamond is attemped under low pressure, in order to realize large area deposition at a high rate. The effect of the ambient gas pressure on the deposition rate and deposition area of the film is studied. It is clarified that the deposition area is extended markedly with decreasing gas pressure. Furthermore, diamond films are successfully synthesized without the large decrease of the deposition rate, even at 5 Torr.
Languages eng
Resource Type journal article
Publishers 応用物理学会
Date Issued 1994
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0021-4922
[NCID]AA10457675
info:doi/10.1143/JJAP.33.4409
[isVersionOf] [URI]http://www.ipap.jp/jjap/index.htm
Schools 大学院理工学研究科(工学)