Contents Menu

Fukumasa Osamu

Affiliate Master Yamaguchi University

Measurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas

Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B Page 4617-4619
published_at 1997-07
Title
Measurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas
Creators Furuse Muneo
Creators Tamura Hitoshi
Creators Watanabe Seiichi
Creators Fukumasa Osamu
Creator Keywords
etching plasma electron cyclotron resonance control of ECR plasma microwave electric field wave propagation uniform plasma
We have developed an apparatus that can measure the three-dimensional distribution of microwave electric field intensity in electron cyclotron resonance (ECR) plasmas. The reflection edge of the incident microwaves depends on the plasma density in the etching chamber: it is the ECR zone when the electron density (n_e) is above 1×10^11 cm^-3 and the electrode when n_e is below 1×10^11 cm^-3. The spatial distribution of the ion saturation current density at the electrode is the same as that of the microwave electric field intensity at the ECR zone. Therefore, in order to obtain uniform ion saturation current density, the intensity of the microwave electric field at the ECR zone must be kept uniform.
Languages eng
Resource Type journal article
Publishers 応用物理学会
Date Issued 1997-07
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0021-4922
[NCID]AA10457675
info:doi/10.1143/JJAP.36.4617
[isVersionOf] [URI]http://www.ipap.jp/jjap/index.htm
Schools 大学院理工学研究科(工学)