Fukumasa Osamu
Affiliate Master
Yamaguchi University
Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy
Thin solid films Volume 506-507
Page 536-540
published_at 2006
Title
Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy
Creators
Nakada Naoki
Creator Keywords
Volume negative ion sources
VUV emission
Vibrationally excited molecules
Effects of Ar addition are studied by using a beam injection type negative ion source. With adding Ar, I_<H-> increases at low base H_2 pressure. At high base H_2 pressure, however, I_<H-> decreases. VUV emission intensities also decrease at high base pressure. In other words, Ar addition is adverse effect for production of H_2 (v''). Therefore, decrease in I_<H-> is caused by decrease in H_2 (v''). In D_2 plasmas, variation patterns of plasma parameters and VUV intensities by Ar addition are nearly the same as ones in H_2 plasmas. Even in low base pressure, however, enhancement of I_<D-> is not observed.
Languages
eng
Resource Type
journal article
Publishers
Elsevier
Date Issued
2006
File Version
Author’s Original
Access Rights
open access
Relations
[ISSN]0040-6090
[NCID]AA00863068
[isVersionOf]
[URI]http://www.sciencedirect.com/science/journal/00406090
Schools
大学院理工学研究科（工学）