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Fukumasa Osamu

Affiliate Master Yamaguchi University

Relationship between control of reactive plasmas with magnetic filter and formation of thin films

Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B Page 4593-4596
published_at 1997-07
2008010015.pdf
[fulltext] 1.02 MB
Title
Relationship between control of reactive plasmas with magnetic filter and formation of thin films
Creators Fukumasa Osamu
Creators Tauchi Yasushi
Creators Sakiyama Satoshi
Creator Keywords
plasma CVD magnetic filter electron energy distribution function multi cusp plasma source spatial control reactive plasmas
Plasma parameters (CH_4/H_2+Ar plasmas) are spatially well controlled using a movable magnetic filter. At any filter position, plasma parameters change dramatically across the magnetic filter. The plasma is divided into two parts, the source plasma region (high density plasmas with energetic electrons) and the diffused plasma region (low electron-temperature plasmas without energetic electrons). Carbon thin films are prepared well in the diffused plasma region. The effects of bias potential of the substrate and control of neutral radicals on formation of thin films are discussed briefly.
Languages eng
Resource Type journal article
Publishers 応用物理学会
Date Issued 1997-07
File Version Author’s Original
Access Rights open access
Relations
[ISSN]0021-4922
[NCID]AA10457675
https://doi.org/10.1143/JJAP.36.4593
[isPartOf] [URI]http://www.ipap.jp/jjap/index.htm
Schools 大学院理工学研究科(工学)