Fukumasa Osamu
Affiliate Master
Yamaguchi University
Relationship between control of reactive plasmas with magnetic filter and formation of thin films
Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B
Page 4593-4596
published_at 1997-07
Title
Relationship between control of reactive plasmas with magnetic filter and formation of thin films
Creator Keywords
plasma CVD
magnetic filter
electron energy distribution function
multi cusp plasma source
spatial control
reactive plasmas
Plasma parameters (CH_4/H_2+Ar plasmas) are spatially well controlled using a movable magnetic filter. At any filter position, plasma parameters change dramatically across the magnetic filter. The plasma is divided into two parts, the source plasma region (high density plasmas with energetic electrons) and the diffused plasma region (low electron-temperature plasmas without energetic electrons). Carbon thin films are prepared well in the diffused plasma region. The effects of bias potential of the substrate and control of neutral radicals on formation of thin films are discussed briefly.
Languages
eng
Resource Type
journal article
Publishers
応用物理学会
Date Issued
1997-07
File Version
Author’s Original
Access Rights
open access
Relations
[ISSN]0021-4922
[NCID]AA10457675
[isPartOf]
[URI]http://www.ipap.jp/jjap/index.htm
Schools
大学院理工学研究科（工学）