Kurisu Hiroki

Affiliate Master Yamaguchi University

Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance

真空 Volume 49 Issue 7 Page 424-429

published_at 2006

Title

反応性電子サイクロトロン共鳴（ECR）スパッタ法によるフェライト薄膜の低温高速作製

Low temperature and high rate deposition of ferrite thin films by reactive sputtering method using electron cyclotron resonance

Creators Tanaka Terumitsu

Creators Oshiro Kazunori

Creators Fujimori Hirotaka

Creators Kurisu Hiroki

Creators Shimosato Yoshihiro

Creators Okada Shigenobu

Creators Matsuura Mitsuru

Creators Yamamoto Setsuo

Languages jpn

Resource Type journal article

Publishers 日本真空協会

Date Issued 2006

File Version Not Applicable (or Unknown)

Access Rights metadata only access

Relations

[ISSN]0559-8516

[NCID]AN00119871

[isVersionOf] [URI]http://www.jstage.jst.go.jp/browse/jvsj/-char/ja/

Schools 大学院理工学研究科（工学）