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Kurisu Hiroki

Affiliate Master Yamaguchi University

Reactive ECR-Sputter-Deposition of Ni-Zn ferrite thin-films for backlayer of PMR media

IEICE Transactions on Electronics Volume E86-C Issue 9 Page 1846-1850
published_at 2003-09
2008010374.pdf
[fulltext] 3.46 MB
Title
Reactive ECR-Sputter-Deposition of Ni-Zn ferrite thin-films for backlayer of PMR media
Creators Wada Hirofumi
Creators Yamamoto Setsuo
Creators Kurisu Hiroki
Creators Matsuura Mitsuru
Creator Keywords
Ni-Zn ferrite thin-film reactive ECR sputtering perpendicular magnetic recording recording media backlayer
A reactive sputtering method using an Electron-Cyclotron-Resonance (ECR) microwave plasma was used to deposit Ni-Zn ferrite thin-films for a soft magnetic backlayer of Co-containing spinel ferrite thin-film perpendicular magnetic recording (PMR) media. The Ni-Zn spinel ferrite thin-films with a preferential orientation of (100) and a relatively low coercivity of 15 Oe were obtained at a high deposition rate of 14 nm/min and at a temperature below 200 degrees C. Although post-annealing treatment in air at 200 degrees C was effective to decrease the coercivity of the Ni-Zn ferrite thin-films, the saturation magnetization and initial permeability decreased and the surface smoothness was deteriorated simultaneously. The Ni-Zn ferrite thin-films prepared by ECR sputtering are promising as the backlayer of the perpendicular magnetic recording medium, but further improvement is required in terms of the soft magnetic properties, the grain size and the surface roughness.
Languages eng
Resource Type journal article
Publishers 電子情報通信学会
Date Issued 2003-09
Rights
copyright 2008 IEICE()
File Version Version of Record
Access Rights open access
Relations
[ISSN]0916-8516
[NCID]AA10826283
[isVersionOf] [URI]http://search.ieice.org/index.html
Schools 大学院理工学研究科(工学)