Contents Menu

Kurisu Hiroki

Affiliate Master Yamaguchi University

Co-γFe_2O_3/NiO thin film disks fabricated by plasma oxidization

Journal of Magnetics Society of Japan Volume 22 Issue S3(Supplement) Page 21-25
published_at 1998
Title
プラズマ酸化法で作製したCo-γFe_2O_3/NiO薄膜磁気ディスク
Co-γFe_2O_3/NiO thin film disks fabricated by plasma oxidization
Creators Yamamoto Setsuo
Creators 山時 照章
Creators Kurisu Hiroki
Creators 松浦 満
Creators 香嶋 純
Creators 中田 健一
Creators 柿原 康男
Creators 土井 孝紀
Creators 田万里 耕作
In the fabrication process of Co-γFe_2O_3/NiO thin film recording disks, new oxidization method using oxygen ions in a plasma was proposed to transform a CoO-Fe_3O_4 filem to a Co-γFe_2O_3 film. Remarkably effective oxidization was achieved by utilizaing oxygen ions produced in an electron-cyclotron-resonance microwave plasma, promotion of oxygen ion generation by Penning ionization effect using metastable He atoms, and neutralization for preventing static electricity of samples. This plasma oxidization method shortened the oxidization processing time to 10 seconds and lowered the process temperature to 150℃ for the 20nm thick CoO-Fe_3O_4 films. Almost same recording characteristics was obtained between the Co-γFe_2O_3/NiO disks prepared by the plasma oxidization method and a conventional heat oxidization method in air.
Languages jpn
Resource Type journal article
Publishers 日本応用磁気学会
Date Issued 1998
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html
Schools 大学院理工学研究科(工学)