Yamamoto Setsuo
Affiliate Master
Yamaguchi University
High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target
Journal of Magnetics Society of Japan Volume 28 Issue 5
Page 703-706
published_at 2004
Title
コーン型ターゲットを用いた反応性ECRスパッタ法によるNi-Znフェライト薄膜の高速作製
High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target
Creators
Kurisu Hiroki
Creators
松浦 満
Creators
下里 義博
Creators
岡田 繁信
Creator Keywords
ECR sputtering
Ni-Zn ferrite
ferrite thin-film
high deposition rate
low temperature sputtering
In order to achieve high rate deposition of Ni-Zn ferrite thin-films in reactive sputtering, a conic target with a sputtering area of 750 cm^2 was equipped in an ECR (electron-cyclotron-resonance) sputtering apparatus. Highly oriented Ni-Zn ferrite thin-films with a saturation magnetization of 290 emu/cc, a low coercivity of 11 Oe, and a relatively small stress of 4 × 10^9 dynes/cm^2 could be prepared at a substrate temperature of 250℃ and a high deposition rate of 44 nm/min. It was found that saturation magnetization and coercivity of the Ni-Zn ferrite thin-films strongly depend on the reduced process parameter: oxygen partial pressure divided by deposition rate.
Languages
jpn
Resource Type
journal article
Publishers
日本応用磁気学会
Date Issued
2004
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
[isVersionOf]
[URI]http://www.wdc-jp.com/msj/journal/index.html
Schools
大学院理工学研究科（工学）