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Yamamoto Setsuo

Affiliate Master Yamaguchi University

High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target

Journal of Magnetics Society of Japan Volume 28 Issue 5 Page 703-706
published_at 2004
Title
コーン型ターゲットを用いた反応性ECRスパッタ法によるNi-Znフェライト薄膜の高速作製
High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target
Creators Yamamoto Setsuo
Creators Kurisu Hiroki
Creators 栗巣 普揮
Creators 松浦 満
Creators 下里 義博
Creators 岡田 繁信
Creator Keywords
ECR sputtering Ni-Zn ferrite ferrite thin-film high deposition rate low temperature sputtering
In order to achieve high rate deposition of Ni-Zn ferrite thin-films in reactive sputtering, a conic target with a sputtering area of 750 cm^2 was equipped in an ECR (electron-cyclotron-resonance) sputtering apparatus. Highly oriented Ni-Zn ferrite thin-films with a saturation magnetization of 290 emu/cc, a low coercivity of 11 Oe, and a relatively small stress of 4 × 10^9 dynes/cm^2 could be prepared at a substrate temperature of 250℃ and a high deposition rate of 44 nm/min. It was found that saturation magnetization and coercivity of the Ni-Zn ferrite thin-films strongly depend on the reduced process parameter: oxygen partial pressure divided by deposition rate.
Languages jpn
Resource Type journal article
Publishers 日本応用磁気学会
Date Issued 2004
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
https://doi.org/10.3379/jmsjmag.28.703
[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html
Schools 大学院理工学研究科(工学)