Yamamoto Setsuo
Affiliate Master
Yamaguchi University
Development of low-temperature and high-rate-deposition technology for ferrite thin-films using ECR sputtering apparatus designed for mass production
粉体および粉末冶金 Volume 53 Issue 8
Page 679-685
published_at 2006-08
Title
量産対応型ECRスパッタ装置によるフェライト薄膜の低温高速製造技術の開発
Development of low-temperature and high-rate-deposition technology for ferrite thin-films using ECR sputtering apparatus designed for mass production
Creators
Matsuura Mitsuru
Creators
Okada Shigenobu
Creators
Shimosato Yoshihiro
Creator Keywords
ECR
electron cyclotron resonance
sputtering
reactive sputtering
ferrite
Languages
jpn
Resource Type
journal article
Publishers
粉体粉末冶金協会
Date Issued
2006-08
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]0532-8799
[NCID]AN00222724
[isVersionOf]
[URI]http://www.journalarchive.jst.go.jp/japanese/top_ja.php
Schools
大学院理工学研究科（工学）