Yamamoto Setsuo
Affiliate Master
Yamaguchi University
Preparation of Co-γFe_2O_3/NiO thin-film media by irradiation with oxygen ions
Journal of Magnetics Society of Japan Volume 23 Issue 4-2
Page 1021-1024
published_at 1999
Title
酸素イオン照射によるCo含有酸化鉄薄膜メディアの作製
Preparation of Co-γFe_2O_3/NiO thin-film media by irradiation with oxygen ions
Creators
山時 照章
Creators
松浦 満
Creators
中田 健一
Creators
柿原 康男
Creators
土井 孝紀
Creators
田万里 耕作
Creator Keywords
Co-γFe_2O_3
NiO
oxidization processes
ECR microwave plasma
Penning ionization
plasma oxidization
A new plasma oxidization method was introduced into the fabrication process of Co-γFe_2O_3/NiO thin-film magnetic recording media in order to transform CoO-Fe_3O_4/NiO films into Co-γFe_2O_3/NiO films. It was found that remarkably effective oxidization was achieved by utilizing oxygen ions generated in an electron-cyclotron-resonance (ECR) microwave plasma, promoting oxygen generation through the Penning ionization effect using metastable He atoms, and neutralizing samples. In the conventional oxidization method, CoO-Fe_3O_4/NiO films were heated up to over 300℃, and kept for 1 to 2 hours in air. The new plasma oxidization method shortened the processing time to 10 seconds and lowered the process temperature to 150℃.
Languages
jpn
Resource Type
journal article
Publishers
日本応用磁気学会
Date Issued
1999
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
[isVersionOf]
[URI]http://www.wdc-jp.com/msj/journal/index.html
Schools
大学院理工学研究科（工学）