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Yamamoto Setsuo

Affiliate Master Yamaguchi University

Plasma oxidation effects of co-containing ferrite thin film media deposited by reactive ECR sputtering

Journal of Magnetics Society of Japan Volume 26 Issue 4 Page 263-268
published_at 2002
Title
反応性ECRスパッタ法で作製したCo含有酸化鉄薄膜メディアのプラズマ酸化処理効果
Plasma oxidation effects of co-containing ferrite thin film media deposited by reactive ECR sputtering
Creators Yamamoto Setsuo
Creators 平田 京
Creators 和田 宏文
Creators Kurisu Hiroki
Creators 松浦 満
Creators 土井 孝紀
Creators 田万里 耕作
Creator Keywords
Co-containing ferrite thin film media reactive ECR sputtering perpendicular magnetic recording recording media plasma oxidation
The post-oxidation effects of reactive-ECR-sputtered Co-containing ferrite thin films are described, focusing on their morphology and their magnetic and recording properties. A combination of reactive-ECR-sputter deposition and post-oxidation with ECR oxygen plasma was proved to be the best method for preparing Co-containing ferrite thin film media with good magnetic properties, smooth surface, low medium-noise characteristics, excellent roll-off curve, and small thermal fluctuation.
Languages jpn
Resource Type journal article
Publishers 日本応用磁気学会
Date Issued 2002
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
info:doi/10.3379/jmsjmag.26.263
[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html
Schools 大学院理工学研究科(工学)