Spatial control of processing plasmas in a multicusp plasma source equipped with a movable magnetic filter
The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society Volume 111 Issue 12
Page 1057-1063
published_at 1991
Title
Spatial control of processing plasmas in a multicusp plasma source equipped with a movable magnetic filter
Creator Keywords
Plasma processing
Multicusp plasma source
Magnetic filter
Electron energy distribution function
Spatial control
It is confirmed, with the use of both a movable magnetic filter and a plasma grid, that plasma parameters (H_2-CH_4 or Ar-CH_4 plasmas) are spatially well controlled. At any filter position, plasma parameters change steeply across the magnetic filter. Then, a plasma source is divided into two parts, i. e. a source plasma region (high density plasma with energetic electrons) and a diffused plasma region (low density and low temperature plasma without energetic electrons). The former is suitable for producing the reactive species and the latter for preparing thin films. In addition, plasma parameters in the diffused plasma are controlled by changing the plasma grid potential. The role of the magnetic filter (i. e. preferential reflection of energetic electrons) is also discussed by computer simulation.
Languages
eng
Resource Type
journal article
Publishers
電気学会
Date Issued
1991
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]0385-4205
[NCID]AN10136312
[isVersionOf]
[URI]http://www.jstage.jst.go.jp/browse/ieejfms/-char/ja/
[isVersionOf]
[URI]http://www.iee.or.jp/
Schools
大学院理工学研究科（工学）