Spectroscopic measurement of DC plasma jet in diamond synthesis
Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B
Page 5003-5006
published_at 1997-07
Title
Spectroscopic measurement of DC plasma jet in diamond synthesis
Creators
Murakami Tomohide
Creators
Kobayashi Tsuyoshi
Creator Keywords
diamond synthesis
plasma jet
spectroscopic measurement
thermal plasma
chemical vapor deposition
In synthesis of diamond with a plasma jet under medium pressure, the morphology of the deposited particles depends strongly on the ratio of the methane gas flow rate to the hydrogen gas flow rate and the distance from the feed ring exit to the substrate. The relationship between the morphology of the deposited particles and the chemical species in the plasma jet is studied by means of emission spectroscopy, with a view toward achieving large-area deposition at a high rate. The intensity ratio of the CH to the Hα spectrum is strongly correlated with the quality of the diamond synthesized and the deposition area.
Languages
eng
Resource Type
journal article
Publishers
応用物理学会
Date Issued
1997-07
File Version
Author’s Original
Access Rights
open access
Relations
[ISSN]0021-4922
[NCID]AA10457675
[isVersionOf]
[URI]http://www.ipap.jp/jjap/index.htm
Schools
大学院理工学研究科（工学）