Efficient negative ion production in rf plasmas using a mesh grid bias method

Efficient negative ion production in rf plasmas using a mesh grid bias method

Creators Okada Junichi

Creators Nakao Yuichi

Creators Tauchi Yasushi

Creators Fukumasa Osamu

Using a grid bias method for plasma parameter control, volume production of hydrogen negative ions H^- is studied in pure hydrogen rf plasmas. Relationship between the extracted H^? ion currents and plasma parameters is discussed. It is confirmed that both high and low electron temperature T_e plasmas are produced in the separated regions when the grid is negatively biased. In addition, with changing grid potential V_g, values of n_e increase while T_e decrease in their values. The negative ion production depends strongly on the grid potential and related plasma conditions.

c2008 American Institute of Physics()

[ISSN]0034-6748

[NCID]AA00817730

info:doi/10.1063/1.2805372

[isVersionOf] [URI]http://rsi.aip.org/rsi/