Pressure dependence of negative hydrogen ion production in a cesium seeded tandem volume source
Japanese journal of applied physics. Pt. 2, Letters Volume 35 Issue 11B
Page L1528-L1531
published_at 1996-11
Title
Pressure dependence of negative hydrogen ion production in a cesium seeded tandem volume source
Creators
Niitani Eiji
Creator Keywords
tandem negative ion source
source modeling
magnetic filter
volume production
vibrationally excited molecules
cesium vapor injection
surface production
Effects of cesium vapor injection on H^- production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. Here, the results with a focus on gas pressure and electron temperature dependences of H^- volume production are presented and discussed. Considering H^- surface production caused by both H atoms and positive hydrogen ions, enhancement of H^- production and pressure dependence of H^- production observed experimentally are qualitatively well reproduced in the model. For enhancement of H^- production, however, so-called electron cooling is not very effective if plasma parameters are initially optimized with the use of a magnetic filter.
Languages
eng
Resource Type
journal article
Publishers
応用物理学会
Date Issued
1996-11
File Version
Author’s Original
Access Rights
open access
Relations
[ISSN]0021-4922
[NCID]AA10650595
[isPartOf]
[URI]http://www.ipap.jp/jjap/index.htm
Schools
大学院理工学研究科（工学）