Measurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas
Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 36 Issue 7B
Page 4617-4619
published_at 1997-07
Title
Measurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas
Creator Keywords
etching plasma
electron cyclotron resonance
control of ECR plasma
microwave electric field
wave propagation
uniform plasma
We have developed an apparatus that can measure the three-dimensional distribution of microwave electric field intensity in electron cyclotron resonance (ECR) plasmas. The reflection edge of the incident microwaves depends on the plasma density in the etching chamber: it is the ECR zone when the electron density (n_e) is above 1×10^11 cm^-3 and the electrode when n_e is below 1×10^11 cm^-3. The spatial distribution of the ion saturation current density at the electrode is the same as that of the microwave electric field intensity at the ECR zone. Therefore, in order to obtain uniform ion saturation current density, the intensity of the microwave electric field at the ECR zone must be kept uniform.
Languages
eng
Resource Type
journal article
Publishers
応用物理学会
Date Issued
1997-07
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0021-4922
[NCID]AA10457675
[isVersionOf]
[URI]http://www.ipap.jp/jjap/index.htm
Schools
大学院理工学研究科（工学）