Identification of cesium effects on enhancement of H- production in a volume negative ion source

Review of Scientific Instruments Volume 65 Issue 4 Page 1213-1215

published_at 1994-04

2007010078.pdf

[fulltext] 2 MB

Title

Identification of cesium effects on enhancement of H- production in a volume negative ion source

Creators Fukumasa Osamu

Creators Tanebe Tomoaki

Creators Naitou Hiroshi

Source Identifiers [PISSN] 0034-6748

Effects of cesium vapor injection on H- production in a tandem source are studied theoretically and parametrically as a function of different surface processes. Model calculation is done by solving a set of particle balance equations in steady-state hydrogen discharge plasmas. By including H- surface production processes caused by H atoms or positive hydrogen ions, enhancement of H- production observed experimentally is reproduced in the model.

Subjects

電気電子工学 ( Other)

Languages eng

Resource Type journal article

Publishers American Institute of Physics

Date Issued 1994-04

File Version Version of Record

Access Rights open access

Relations

[isVersionOf] https://doi.org/10.1063/1.1145009

[isPartOf] [URI]http://rsi.aip.org/rsi/

Schools 大学院理工学研究科（工学）