High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target

コーン型ターゲットを用いた反応性ECRスパッタ法によるNi-Znフェライト薄膜の高速作製

High-rate reactive-ECR-sputter-deposition of Ni-Zn ferrite thin films using conic sputtering target

Creators Yamamoto Setsuo

Creators Kurisu Hiroki

Creators 栗巣 普揮

Creators 松浦 満

Creators 下里 義博

Creators 岡田 繁信

In order to achieve high rate deposition of Ni-Zn ferrite thin-films in reactive sputtering, a conic target with a sputtering area of 750 cm^2 was equipped in an ECR (electron-cyclotron-resonance) sputtering apparatus. Highly oriented Ni-Zn ferrite thin-films with a saturation magnetization of 290 emu/cc, a low coercivity of 11 Oe, and a relatively small stress of 4 × 10^9 dynes/cm^2 could be prepared at a substrate temperature of 250℃ and a high deposition rate of 44 nm/min. It was found that saturation magnetization and coercivity of the Ni-Zn ferrite thin-films strongly depend on the reduced process parameter: oxygen partial pressure divided by deposition rate.

[ISSN]0285-0192

[NCID]AN0031390X

https://doi.org/10.3379/jmsjmag.28.703

[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html