Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods
Electrochimica acta Volume 56 Issue 3
Page 1172-1181
published_at 2011-01-01
Title
Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods
Creators
Tanaka Yoriko
Creators
Furuta Masahiro
Creators
Kuriyama Koichi
Creators
Kuwabara Ryosuke
Creators
Katsuki Yukiko
Creators
Kondo Takeshi
Creators
Fujishima Akira
Creator Keywords
Nitrogen-doped hydrogenated amorphous
carbon
Plasma-enhanced chemical vapor
deposition
Languages
eng
Resource Type
journal article
Publishers
Pergamon Press
Elsevier Science
Date Issued
2011-01-01
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0013-4686
[NCID]AA00633261
[NCID]AA11525861
[isVersionOf]
[URI]http://www.sciencedirect.com/science/journal/00134686
[isVersionOf]
[URI]http://www.scopus.com/inward/record.url?eid=2-s2.0-78650513397&partnerID=40&md5=40f3b5fa7072e86476688453c5c226b1
Schools
大学院理工学研究科（理学）