Characterization of CuCl nanocrystals in SiO_2 matrix fabricated by inductively coupled plasma-assisted sputtering deposition
Journal of vacuum science & technology. Second series. B, Microelectronics and nanometer structures, processing, measurement and phenomena Volume 21 Issue 5
Page 2169-2173
published_at 2003-09
Title
Characterization of CuCl nanocrystals in SiO_2 matrix fabricated by inductively coupled plasma-assisted sputtering deposition
Creators
Nagoya Kazutaka
Creators
Yamada Naoko
Creators
Matsuura Mitsuru
Languages
eng
Resource Type
journal article
Publishers
American Vacuum Society
Date Issued
2003-09
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]1071-1023
[NCID]AA10804928
[isVersionOf]
[URI]http://scitation.aip.org/jvstb/
Schools
大学院理工学研究科（工学）