YIG ferrite thin-films epitaxially grown by reactive sputtering method
粉体および粉末冶金 Volume 51 Issue 3
Page 190-194
published_at 2004
Title
反応性スパッタ法による作製においてエピタキシャル成長したYIGフェライト薄膜
YIG ferrite thin-films epitaxially grown by reactive sputtering method
Creators
Kuniki Hirofumi
Creators
Matsuura Mitsuru
Creators
Jang Pyungwoo
Creator Keywords
reactive sputtering
YIG ferrite
post-annealing
GGG(111) substrate
hetero-epitaxial growth
Languages
jpn
Resource Type
journal article
Publishers
粉体粉末冶金協会
Date Issued
2004
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]0532-8799
[NCID]AN00222724
[isVersionOf]
[URI]http://www.journalarchive.jst.go.jp/japanese/top_ja.php
Schools
大学院理工学研究科（工学）