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Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica acta Volume 56 Issue 3

Creators : Tanaka Yoriko | Furuta Masahiro | Kuriyama Koichi | Kuwabara Ryosuke | Katsuki Yukiko | Kondo Takeshi | Fujishima Akira | Honda Kensuke Publishers : Pergamon Press | Elsevier Science Date Issued : 2011-01-01