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Preparation of Co-Cr films using magnetron sputtering assisted by inductively coupled rf plasma

日本応用磁気学会学術講演概要集 Volume 21 Page 159-
published_at 1997
2009010279.pdf
[fulltext] 137 KB
Title
誘導結合型プラズマ支援マグネトロンスパッタ法によるCo-Cr膜の作成 : 基板バイアスの効果
Preparation of Co-Cr films using magnetron sputtering assisted by inductively coupled rf plasma
Creators Hayashi T.
Creators Yamamoto S.
Creators Santoki T.
Creators Kurisu H.
Creators Matsuura M.
Languages jpn
Resource Type conference paper
Publishers 日本応用磁気学会
Date Issued 1997
Rights
Copyright : 日本応用磁気学会 (The Magnetics Society of Japan)()
File Version Version of Record
Access Rights open access
Relations
[ISSN]1340-8100
[NCID]AN10269644
Schools 大学院理工学研究科(工学)