Contents Menu

Development of ECR Negative Ion Sources - Effects of Argon Addition for ECR Plasmas

IEEE International Conference on Plasma Science Page 211-211
published_at 2003-06
2007010006.pdf
[fulltext] 208 KB
Title
Development of ECR Negative Ion Sources - Effects of Argon Addition for ECR Plasmas
Creators Fujioka K.
Creators Fukumasa O.
We have studied high-density plasma production and high efficiency H/sup $/production in ECR discharge plasmas with linecups-type and ring-cups-type magnetic fields, which are different ECR resonance conditions. In this paper, we report the effects of Ar addition on plasma parameters and negative ion production in ECR plasmas.
Languages eng
Resource Type conference paper
Publishers Institute of Electrical and Electronics Engineers
Date Issued 2003-06
Rights
c2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. IEEE International Conference on Plasma Science, 2003, 211()
File Version Version of Record
Access Rights open access
Relations
info:doi/10.1109/PLASMA.2003.1228698
[ISBN]078037911X
Schools 大学院理工学研究科(工学)