Development of ECR Negative Ion Sources - Effects of Argon Addition for ECR Plasmas
IEEE International Conference on Plasma Science
Page 211-211
published_at 2003-06
Title
Development of ECR Negative Ion Sources - Effects of Argon Addition for ECR Plasmas
Creators
Fujioka K.
We have studied high-density plasma production and high efficiency H/sup $/production in ECR discharge plasmas with linecups-type and ring-cups-type magnetic fields, which are different ECR resonance conditions. In this paper, we report the effects of Ar addition on plasma parameters and negative ion production in ECR plasmas.
Languages
eng
Resource Type
conference paper
Publishers
Institute of Electrical and Electronics Engineers
Date Issued
2003-06
Rights
c2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. IEEE International Conference on Plasma Science, 2003, 211()
File Version
Version of Record
Access Rights
open access
Schools
大学院理工学研究科（工学）