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Electron energy dependence of vacuum ultraviolet emission and H- production in a low-pressure hydrogen plasma

Review of Scientific Instruments Volume 69 Issue 2 Page 995-997
published_at 1998-02
2007010070.pdf
[fulltext] 1.77 MB
Title
Electron energy dependence of vacuum ultraviolet emission and H- production in a low-pressure hydrogen plasma
Creators Fukumasa Osamu
Creators Mizuki Norihisa
Creators Niitani Eiji
A two-step process of pure H- volume production via vibrationally excited ground state molecules H2(v5) is discussed. The principal source of this vibrational excitation is through singlet excitation by fast primary electrons followed by vacuum ultraviolet (VUV) emission. The VUV emission from a low-pressure hydrogen plasma has been used to study the production mechanism of H2(v5) molecules and its electron energy dependence, in a double plasma source where both energy and density of fast electrons are well controlled. The fast electron energy and density strongly affect the VUV emission intensity at wave lengths of, for example, 123 and 124.9 nm. There exists a certain threshold in fast electron energy for singlet excitation and then for H2(v) excitation. Fast electrons with energy in excess of 15-20 eV mainly contribute to the VUV emission intensity and are sufficient to increase H- production.
Subjects
電気電子工学 ( Other)
Languages eng
Resource Type journal article
Publishers American Institute of Physics
Date Issued 1998-02
File Version Version of Record
Access Rights open access
Relations
[ISSN]0034-6748
[NCID]AA00817730
info:doi/10.1063/1.1148621
[isVersionOf] [URI]http://rsi.aip.org/rsi/
Schools 大学院理工学研究科(工学)