Synthesis of diamond using low pressure plasma jet
Japanese journal of applied physics. Pt. 1, Regular papers & short notes Volume 33 Issue 7B
Page 4409-4412
published_at 1994
Title
Synthesis of diamond using low pressure plasma jet
Creator Keywords
diamond synthesis
chemical vapor deposition
plasma jet
thermal plasma
plasma processing
With the use of the forced constricted type plasma jet, the synthesis of diamond is attemped under low pressure, in order to realize large area deposition at a high rate. The effect of the ambient gas pressure on the deposition rate and deposition area of the film is studied. It is clarified that the deposition area is extended markedly with decreasing gas pressure. Furthermore, diamond films are successfully synthesized without the large decrease of the deposition rate, even at 5 Torr.
Languages
eng
Resource Type
journal article
Publishers
応用物理学会
Date Issued
1994
File Version
Not Applicable (or Unknown)
Access Rights
metadata only access
Relations
[ISSN]0021-4922
[NCID]AA10457675
[isVersionOf]
[URI]http://www.ipap.jp/jjap/index.htm
Schools
大学院理工学研究科（工学）