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Heat and mass transfer analysis for coating process of TiN thin film in a tubular reactor by thermal CVD

Kagaku kogaku ronbunshu Volume 40 Issue 5 Page 425-431
published_at 2014-09-20
Title
熱CVD法を用いた水平管型反応器内のTiN薄膜生成過程における熱物質移動解析
Heat and mass transfer analysis for coating process of TiN thin film in a tubular reactor by thermal CVD
Creators Hatori Yuya
Creators Yamamoto Hiroki
Creators Tanoue Kenichiro
Creators Nishimura Tatsuo
Creator Keywords
化学蒸着法 窒化チタン 表面反応 拡散律速 数値解析 Chemical vapor deposition Diffusion-controlling Numerical simulation Surface reaction Titanium nitride
Languages jpn
Resource Type journal article
Publishers 化学工学会
Date Issued 2014-09-20
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0386-216X
[NCID]AN00037234
info:doi/10.1252/kakoronbunshu.40.425
[isVersionOf] [URI]https://www.jstage.jst.go.jp/browse/kakoronbunshu/40/5/_contents/-char/ja
Schools 大学院理工学研究科 大学院理工学研究科(工学)