コンテンツメニュー

Naitou Hiroshi

Affiliate Master Yamaguchi University

Spatial control of processing plasmas in a multicusp plasma source equipped with a movable magnetic filter

The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society Volume 111 Issue 12 Page 1057-1063
published_at 1991
2008010170.pdf
[fulltext] 502 KB
Title
Spatial control of processing plasmas in a multicusp plasma source equipped with a movable magnetic filter
Creators Fukumasa Osamu
Creators Naitou Hiroshi
Creators Sakiyama Satoshi
Creator Keywords
Plasma processing Multicusp plasma source Magnetic filter Electron energy distribution function Spatial control
It is confirmed, with the use of both a movable magnetic filter and a plasma grid, that plasma parameters (H_2-CH_4 or Ar-CH_4 plasmas) are spatially well controlled. At any filter position, plasma parameters change steeply across the magnetic filter. Then, a plasma source is divided into two parts, i. e. a source plasma region (high density plasma with energetic electrons) and a diffused plasma region (low density and low temperature plasma without energetic electrons). The former is suitable for producing the reactive species and the latter for preparing thin films. In addition, plasma parameters in the diffused plasma are controlled by changing the plasma grid potential. The role of the magnetic filter (i. e. preferential reflection of energetic electrons) is also discussed by computer simulation.
Languages eng
Resource Type journal article
Publishers 電気学会
Date Issued 1991
File Version Version of Record
Access Rights open access
Relations
[ISSN]0385-4205
[NCID]AN10136312
[isVersionOf] [URI]http://www.jstage.jst.go.jp/browse/ieejfms/-char/ja/
[isVersionOf] [URI]http://www.iee.or.jp/
Schools 大学院理工学研究科(工学)