コンテンツメニュー

Naitou Hiroshi

Affiliate Master Yamaguchi University

Control of reactive plasmas in a multicusp plasma source equipped with a movable magnetic filter

Journal of Applied Physics Volume 74 Issue 2 Page 848-852
published_at 1993-07
2007010092.pdf
[fulltext] 357 KB
Title
Control of reactive plasmas in a multicusp plasma source equipped with a movable magnetic filter
Creators Fukumasa Osamu
Creators Naitou Hiroshi
Creators Sakiyama Satoshi
With the use of both a movable magnetic filter and a plasma grid, plasma parameters (H2-CH4 or Ar-CH4 plasmas) are spatially well controlled. At any filter position, plasma parameters change steeply across the magnetic filter. Then, a plasma source is divided into the two parts, i.e., the source plasma region (high density plasma with energetic electrons) and the diffused plasma region (low density and low-temperature plasma without energetic electrons). Plasma parameters in the diffused plasma are well controlled by changing the plasma grid potential. The role of the magnetic filter (i.e., preferential reflection of energetic electrons) is well clarified by computer simulation. The relation between plasma parameters and some species of neutral radicals is also briefly discussed.
Subjects
電気電子工学 ( Other)
Languages eng
Resource Type journal article
Publishers American Institute of Physics
Date Issued 1993-07
File Version Version of Record
Access Rights open access
Relations
[ISSN]0021-8979
info:doi/10.1063/1.354876
[isVersionOf] [URI]http://jap.aip.org/
Schools 大学院理工学研究科(工学)